2026 International Symposium on Advanced Manufacturing Technologies
Speakers
Plenary Speaker — Academician Ding Han
| Name / Title | Prof. Ding Han |
| Affiliation | Huazhong University of Science and Technology |
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| Seminar Title / 报告题目 | Robotized Intelligent Manufacturing / 机器人化智能制造 |
| Seminar Abstract | This talk will introduce the current research activities of robotized intelligent manufacturing in China. It will discuss the primary scientific challenges and key scientific problems of the robotized intelligent manufacturing, mainly focusing on mechanism, perception and control. The talk will also forecast China’s expected breakthroughs and goals in robotic research. Finally, the talk will present recent research results of our group and discuss current and future challenges. |
Plenary Speaker — Academician Jian LU
| Name / Title | Academician Jian LU |
| Affiliation | Center for Advanced and Smart Manufacturing, Hongqiao Research Institute for Light Metal, City University of Hong Kong |
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| Seminar Title / 报告题目 | Additive Manufacturing Empowered New Materials Development and Design / 增材制造赋能新材料的开发和设计 |
| Seminar Abstract | This presentation showcases breakthrough discoveries in AI-empowered new materials development through advanced additive manufacturing that addresses critical challenges in mechanical, biomedical and energy systems. Novel nanostructured and Turing-patterned materials emerge from the convergence of additive manufacturing and AI-driven computational design. Applications include biomimetic materials and structure; 4D printing, highly efficient catalysis for hydrogen economy through enhanced water splitting and fuel cells. These innovations unlock unprecedented functionality addressing society’s pressing technological and healthcare challenges. |
Plenary Speaker — Ir Professor Cheung Chi Fai, Benny
| Name / Title | Ir Professor Cheung Chi Fai, Benny |
| Affiliation | State Key Laboratory of Ultra-precision Machining Technology, The Hong Kong Polytechnic University |
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| Seminar Title / 报告题目 | Advances in Ultra-precision Machining Technology and Applications / 超精密加工技术前沿及应用 |
| Seminar Abstract | Ultra-precision machining technologies are widely employed to achieve surface finishes at the nanometer scale and form accuracy within the sub-micrometer range. These technologies find applications in fields including advanced optics, photonics, telecommunications, biomedicine, biomimetics, and aerospace. The surface quality and functional performance of workpieces are closely linked to the mechanisms of nanometric surface generation during the ultra-precision machining process. Currently, achieving ultra-mirror surface finishes and desired functional outcomes in many industrial applications still relies heavily on the experience of researchers and the skills of operators. However, our scientific understanding of nanometric surface generation in ultra-precision machining remains incomplete. This presentation discusses the latest research on ultra-precision machining and its nanometric surface generation mechanisms. It also explores the relationships among surface quality, functional performance, and nanometric surface generation for workpieces produced using various ultra-precision machining technologies. The presentation aims to shed light on perspectives that could facilitate the expanded application of ultra-precision machining technologies. |
Plenary Speaker — Prof. Yifan Dai
| Name / Title | Prof. Yifan Dai |
| Affiliation | National University of Defense Technology |
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| Seminar Title / 报告题目 | A Preliminary Exploration of Atomic-Level Precision Manufacturing / 原子级精度制造初探 |
| Seminar Abstract | Short-wavelength optical components, operating in the ultraviolet to X-ray wavelength range, are core elements of major optical engineering projects such as photolithography, free-electron lasers, and laser fusion systems. They demand atomic-level precision and represent the cutting edge of optical manufacturing technology. This report focuses on photolithography objective lenses and X-ray reflectors as typical processing targets. To overcome the challenge of suppressing atomic-scale mid‑ and high‑frequency errors on optical surfaces, an innovative polishing method based on shear‑thickening elastic force confinement is proposed. The mechanism by which strong shear elastic force confinement regulates atomic migration is introduced. Leveraging the principle of material removal via elastic force, atomic‑level ultra‑smooth surfaces are generated. The high‑precision and efficient suppression of mid‑ and high‑frequency errors is achieved through shear‑thickening effects. On this basis, a combined processing technology for achieving atomic‑level accuracy on complex curved surfaces is proposed, and new equipment is developed, thereby laying a manufacturing foundation to meet demands for short‑wavelength optical components. |